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Updated: Jun 24, 2026

Implementation of a Reference Interferometer for Nanodetection
16:11

Implementation of a Reference Interferometer for Nanodetection

Published on: April 26, 2014

Balanced interferometric system for stability measurements.

Jonathan D Ellis1, Ki-Nam Joo, Jo W Spronck

  • 1PME: Mechatronic System Design, Delft University of Technology, Mekelweg 2, 2628 CD Delft, The Netherlands. j.d.ellis@tudelft.nl

Applied Optics
|March 24, 2009
PubMed
Summary
This summary is machine-generated.

We developed two interferometer designs for material stability testing. A single-pass system demonstrated high precision, measuring drift rates below 1 pm/h for thin-film silver samples.

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Area of Science:

  • Metrology
  • Materials Science
  • Optical Engineering

Background:

  • Accurate measurement of material stability is crucial for advanced applications.
  • Interferometry offers high sensitivity for detecting minute changes in materials.
  • Existing methods may be susceptible to environmental disturbances and component misalignment.

Purpose of the Study:

  • To present and compare two novel double-sided interferometer designs for material stability assessment.
  • To evaluate the performance of a single-pass interferometer design for measuring thin-film material stability.
  • To determine the short-term repeatability and long-term stability of the single-pass interferometer.

Main Methods:

  • Development of two balanced, double-sided interferometer configurations: a double-pass and a single-pass system.
  • Tolerancing analysis to assess susceptibility to misalignment and motion.
  • Experimental testing of the single-pass interferometer using an 86 nm thin-film silver sample.
  • Conducting 66 short-term repeatability tests (30 min each) and two long-term stability tests (>9 h).

Main Results:

  • The single-pass interferometer design shows reduced susceptibility to initial component misalignment compared to the double-pass design.
  • Excellent short-term repeatability was achieved, with a mean measured drift rate below 1 pm/h root mean square (rms).
  • Long-term stability tests confirmed low drift rates (<1.1 pm/h) and good agreement with short-term measurements, with a mean measured length change of 2 nm rms.

Conclusions:

  • The developed single-pass interferometer is a robust and precise instrument for material stability measurements.
  • The system exhibits high accuracy and repeatability, suitable for detecting sub-nanometer changes.
  • This technology advances the capability for characterizing the stability of thin-film materials.