Study of ion transport models for electroanalytical simulation. Part 2: experimental comparison

Area of Science:

• Electrochemistry
• Physical Chemistry
• Chemical Engineering

Background:

• Ion transport models are crucial for simulating electrodeposition processes.
• Commercial electroanalytical tools often use the pseudoideal solution model.
• A more rigorous approach involves linear phenomenological equations.

Purpose of the Study:

• To compare the accuracy of the pseudoideal solution model and a rigorous ion transport model.
• To investigate the impact of the formal association constant in the pseudoideal model.
• To simulate copper deposition limiting current density using different ion transport models.

Main Methods:

• Simulating limiting current density for copper deposition.
• Employing the pseudoideal solution model.
• Utilizing linear phenomenological equations with mean spherical approximation (MSA) for activity and Onsager coefficients.

Main Results:

• The rigorous model with MSA provided a more accurate simulation of copper deposition limiting current density.
• The pseudoideal solution model's accuracy is influenced by the formal association constant.
• Differences between the models highlight the importance of rigorous ion transport considerations.

Conclusions:

• The mean spherical approximation (MSA) offers a more accurate approach for ion transport modeling in electrodeposition compared to the pseudoideal model.
• Accurate simulation of copper deposition requires careful consideration of ion activity and transport phenomena.
• Further refinement of ion transport models can improve the predictability of electroanalytical simulations.