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Atomic Force Microscopy

Atomic Force Microscopy

Atomic force microscopy (AFM) is a type of scanning probe microscopy that can analyze topographic details of various specimens like ceramics, glass, polymers, and biological samples. AFM offers over 1000 times more resolution than the optical imaging system. Images generated from AFM are three-dimensional surface profiles, offering an advantage over the flat, two-dimensional images from other imaging techniques.
The AFM Probe
The probe is regarded as the heart of any AFM setup and comprises the...

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Related Experiment Video

Updated: Jun 24, 2026

High-Speed Atomic Force Microscopy Imaging of DNA Three-Point-Star Motif Self Assembly Using Photothermal Off-Resonance Tapping

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High-speed atomic force microscope lithography using a piezo tube scanner driven by a sinusoidal waveform.

Gwangmin Kwon¹, Sang-Hyun Kim, Meehye Jeong

¹Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791, Republic of Korea.

Ultramicroscopy

|April 7, 2009

Summary

This summary is machine-generated.

High-speed atomic force microscope (AFM) lithography is achieved using sinusoidal waveforms and sensitive organic resists. This method enhances nanostructure fabrication speed and pattern quality for advanced applications.

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Area of Science:

Nanotechnology
Materials Science
Surface Science

Background:

Atomic force microscope (AFM) lithography is crucial for nanolithography.
Conventional AFM scanners use triangular signals, limiting speed due to mechanical instability.

Purpose of the Study:

To improve the throughput of AFM lithography for practical nanolithography applications.
To explore alternative driving signals and materials for faster AFM lithography.

Main Methods:

Utilized sinusoidal waveform signals to drive the AFM piezo tube scanner.
Employed highly sensitive noble organic resists containing a photo acid generator.
Fabricated cross-linked polymer nanostructures using the sinusoidal driving method.

Main Results:

Achieved high-speed lithography by employing sinusoidal waveform driving.
Demonstrated improved linearity and uniformity of nanostructure line patterns.
Overcame speed limitations associated with conventional triangular waveform driving.

Conclusions:

Sinusoidal waveform driving is a viable strategy for high-throughput AFM lithography.
The combination of sinusoidal driving and sensitive organic resists significantly enhances fabrication speed.
This approach offers improved control over nanostructure quality, paving the way for broader nanolithography applications.