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Fabrication of High Contrast Gratings for the Spectrum Splitting Dispersive Element in a Concentrated Photovoltaic System
Published on: July 18, 2015
Vacuum-ultraviolet blazed silicon grating anisotropically etched by native-oxide mask
Bin Sheng1, Xiangdong Xu, Ying Liu
1National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China.
Optics Letters
|April 17, 2009
Summary
A novel method uses patterned silicon wafers to create precisely controlled blazed gratings. This technique enhances blaze efficiency in the vacuum-ultraviolet region, improving optical performance.
Area of Science:
- Optics and Photonics
- Materials Science
- Nanofabrication
Background:
- Blazed gratings are crucial optical components for spectral dispersion.
- Fabrication challenges include controlling blaze angle and minimizing groove deficiencies.
- Existing methods often struggle with precision and efficiency.
Purpose of the Study:
- To present a simple and convenient method for controlling blazed grating profiles.
- To improve the smoothness of blaze facets and minimize groove apex deficiencies.
- To enhance blaze efficiency in the vacuum-ultraviolet (VUV) wavelength region.
Main Methods:
- Utilized patterned native-oxide layers on off-cut silicon (111) wafers as a mask.
- Employed anisotropic etching to precisely shape the grating profile.
- Fabricated a 1200 lines/mm blazed grating with a 5.0-degree blaze angle.
Main Results:
- Achieved well-controlled blazed grating profiles with smooth blaze facets (approx. 0.2 nm rms).
- Successfully minimized deficiencies at the groove apexes.
- Demonstrated high blaze efficiency in the vacuum-ultraviolet wavelength region.
Conclusions:
- The described technique offers a simple and effective way to fabricate high-performance blazed gratings.
- The method enables precise control over grating profiles, leading to improved optical characteristics.
- Fabricated gratings show significant potential for applications in VUV spectroscopy and optics.
