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Updated: Jun 23, 2026

The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
Quantitative optical recognition of highly reproducible ultrathin oxide films in microelectrochemical anodization
Andrei Ionut Mardare1, Achim Walter Hassel
1Max-Planck-Institut für Eisenforschung GmbH, Max-Planck-Str. 1, 40237 Düsseldorf, Germany.
Abstract:
Automatized microelectrochemical investigations are achieved using a scanning droplet cell. The area reproducibility for a 100 mum oxide spot is found to be better than 1%, a value typically difficult to reach even in macroscopic samples. A systematic change in color appearance is seen for oxide films with a thickness ranging from 14 to 27 nm. Analysis of optical images yields a strictly linear relation between relative transmission and anodization charge and thus allows determination of the oxide thickness with a remarkable precision better than 0.5 nm at an absolute film thickness value that is at least a factor of 20 smaller than the wavelength of light.

