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Related Experiment Video

Updated: Jun 23, 2026

Fabricating Nanogaps by Nanoskiving
07:36

Fabricating Nanogaps by Nanoskiving

Published on: May 13, 2013

Self-aligned nanolithography in a nanogap.

Yung-Chen Lin1, Jingwei Bai, Yu Huang

  • 1Department of Materials Science and Engineering, University of California, Los Angeles, Los Angeles, California 90095, USA.

Nano Letters
|May 6, 2009
PubMed
Summary

A novel self-aligned nanolithography method creates nanoscale via holes in nanogaps. This technique enables precise fabrication of electrode-nanoisland-electrode tunneling junctions for nanodevice engineering.

Area of Science:

  • Nanoscience and Nanotechnology
  • Materials Science
  • Electrical Engineering

Background:

  • Fabricating precise electrical contacts to nanoscale components is crucial for advancing nanodevice engineering.
  • Existing methods for creating nanogaps and integrating nanostructures often face challenges in alignment and scalability.

Purpose of the Study:

  • To develop a self-aligned nanolithography technique for creating nanoscale via holes within nanogaps.
  • To demonstrate the fabrication of electrode-nanoisland-electrode tunneling junction devices using this method.
  • To establish a general pathway for electrical contact to individual nanostructures.

Main Methods:

  • Utilizing field emission between nanogap electrodes to expose polymer resist.
  • Employing bias voltage to ablate polymer resist within the nanogap, forming via holes.

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Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

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Last Updated: Jun 23, 2026

Fabricating Nanogaps by Nanoskiving
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Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
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Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
07:47

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

  • Controlling via hole diameter from 20 nm to over 100 nm, comparable to nanogap width.

    • Main Results:

    • Successfully formed self-aligned nanoscale via holes within nanogaps.
    • Demonstrated the creation of single and array via holes with controllable dimensions.
    • Fabricated electrode-nanoisland-electrode tunneling junction devices with precise alignment.
    • Observed typical tunneling characteristics in electrical measurements at room temperature.

    Conclusions:

    • The reported self-aligned nanolithography approach offers a versatile method for fabricating nanoscale via holes.
    • This technique facilitates the precise integration of nanostructures for functional nanodevice applications.
    • The demonstrated pathway is essential for advancing the development of novel electronic and quantum devices.