Electro-oxidative nanopatterning of silane monolayers on boron-doped diamond electrodes

Oxidized boron-doped diamond (BDD) electrodes were coated with a monolayer of n-octadecyltrichlorosilane as well as of other silanes. Scanning force microscopy was applied to pattern these monolayers, utilizing doped diamond-coated conductive probes. Patterns were generated on the nanometer scale, and conditions for the patterning process were quantified with regard to humidity and potential bias. It was observed that a sample bias of 3-3.5 V and a relative humidity >70% are necessary to generate reproducible and stable patterns. At potentials and relative humidities below these values, no or incomplete removal of the monolayer occurred. The results show that electro-oxidative patterning is an expedient way for the generation of nanostructures on chemically modified BDD.