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Related Experiment Video

Updated: Jun 23, 2026

Antifouling Self-assembled Monolayers on Microelectrodes for Patterning Biomolecules
10:27

Antifouling Self-assembled Monolayers on Microelectrodes for Patterning Biomolecules

Published on: August 25, 2009

Nanoscale patterning of ionic self-assembled multilayers.

Aysen Tulpar1, Zhiyong Wang, Chang-Hyun Jang

  • 1Department of Chemistry, Virginia Tech, Blacksburg, VA 24061, USA.

Nanotechnology
|May 8, 2009
PubMed
Summary

Nanografting and ionic self-assembled multilayers (ISAMs) enable precise fabrication of 3D nanostructured films. This method offers mask-free, in situ pattern alteration for advanced nanofabrication.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Chemistry

Background:

  • Fabricating 3D nanostructured films is crucial for advanced materials.
  • Existing nanofabrication methods often require masks or complex processing.

Purpose of the Study:

  • To develop a precise and efficient method for creating 3D nanostructured films.
  • To demonstrate the use of nanografting and ISAMs for controlled nanofabrication.

Main Methods:

  • Utilized nanografting to pattern carboxylic acid (-COOH) surface groups on hydroxyl (-OH) terminated surfaces.
  • Employed ionic self-assembled multilayers (ISAMs) for selective growth on patterned areas.
  • Verified selective growth and pattern dimensions using Atomic Force Microscopy (AFM).

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Last Updated: Jun 23, 2026

Antifouling Self-assembled Monolayers on Microelectrodes for Patterning Biomolecules
10:27

Antifouling Self-assembled Monolayers on Microelectrodes for Patterning Biomolecules

Published on: August 25, 2009

Ligand Nano-cluster Arrays in a Supported Lipid Bilayer
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Ligand Nano-cluster Arrays in a Supported Lipid Bilayer

Published on: April 23, 2017

Patterning of Microorganisms and Microparticles through Sequential Capillarity-assisted Assembly
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Main Results:

  • Achieved selective growth of ISAM bilayers exclusively on -COOH patterned regions.
  • Demonstrated precise control over pattern size, with achieved line widths of 75 nm.
  • Confirmed pattern stability through repeated washing and in situ alteration capabilities.

Conclusions:

  • Nanografting combined with ISAM deposition offers a mask-free, rapid, and precise nanofabrication technique.
  • The method allows for in situ modification of templates without specialized equipment.
  • The technique's resolution is limited by AFM tip width, suggesting potential for sub-25 nm features with sharper tips.