Nanoscale patterning of ionic self-assembled multilayers

Films that are nanostructured in all three dimensions can be fabricated by the templated growth of ionic self-assembled multilayers (ISAMs) on solids that have been patterned by nanografting. Nanografting was used to controllably pattern -COOH surface groups on a background of -OH groups. Atomic force microscopy (AFM) confirms that ISAM bilayers grow selectively on the -COOH groups and not on the surrounding -OH groups. The patterned area clearly shows an increase in height with an increase in the number of bilayers. As compared with other methods of nanofabrication, nanografting with ISAM deposition provides fast and precise control over the size of the pattern region, which remains stable even after repeated washing. This combination allows the fabricated template to be altered in situ without the need of any kind of mask, expensive probe, or post-lithography processing/cleaning methods. We have demonstrated line widths of 75 nm. Ultimately the line width is limited by the width of the AFM tip that causes desorption of the thiol, which is typically about 25 nm. Smaller line widths should be possible with the use of sharper AFM tips.