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Related Experiment Video

Updated: Jun 23, 2026

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
10:49

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting

Published on: January 23, 2013

Quantized patterning using nanoimprinted blanks.

Stephen Y Chou1, Wen-Di Li, Xiaogan Liang

  • 1NanoStructure Laboratory, Department of Electrical Engineering, Princeton University,Princeton, NJ 08544, USA. chou@princeton.edu

Nanotechnology
|May 8, 2009
PubMed
Summary
This summary is machine-generated.

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See all related articles

Quantum lithography (QL) blanks can now be fabricated using nanoimprinting, overcoming a 17-year barrier. This breakthrough significantly enhances scanning electron beam lithography (EBL) throughput and reduces costs for advanced semiconductor manufacturing.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Semiconductor Manufacturing

Background:

  • Quantum lithography (QL) offers potential for high-throughput, low-cost semiconductor fabrication.
  • A major obstacle to QL implementation has been the lack of viable methods for producing necessary QL blanks.
  • Previous attempts at QL have been hindered by the absence of scalable blank fabrication techniques.

Purpose of the Study:

  • To propose and demonstrate a novel, general approach for fabricating Quantum Lithography (QL) blanks.
  • To overcome the limitations of previous methods and enable the practical application of QL.
  • To show that the developed QL blanks can significantly improve Electron Beam Lithography (EBL) performance.

Main Methods:

  • Developed a new wafer-scale nanoimprint mold fabrication process.

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Patterning via Optical Saturable Transitions - Fabrication and Characterization

Published on: December 11, 2014

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Last Updated: Jun 23, 2026

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
10:49

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting

Published on: January 23, 2013

Atomically Traceable Nanostructure Fabrication
12:35

Atomically Traceable Nanostructure Fabrication

Published on: July 17, 2015

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08:19

Patterning via Optical Saturable Transitions - Fabrication and Characterization

Published on: December 11, 2014

  • Utilized a combination of interference lithography, self-perfection, and multiple nanoimprinting steps.
  • Fabricated Quantum Lithography (QL) blanks featuring a 2D Cr square tile array with specific dimensions (200 nm pitch, 9 nm gap, sub-10 nm corners).

    • Main Results:

    • Successfully fabricated QL blanks suitable for a 50 nm node 4x photomask.
    • Demonstrated that QL significantly relaxes requirements for Electron Beam Lithography (EBL) tools.
    • Showcased an orders-of-magnitude increase in EBL throughput and a reduction in cost.
    • Confirmed the scalability of the QL blank fabrication method to the 22 nm node.

    Conclusions:

    • The proposed nanoimprint-based fabrication method provides a viable pathway for producing Quantum Lithography (QL) blanks.
    • This advancement removes a critical bottleneck, paving the way for the practical implementation of QL.
    • QL technology, enabled by these new blanks, promises to revolutionize semiconductor lithography by dramatically improving efficiency and cost-effectiveness.