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Related Concept Videos

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used.
Atomic Emission Spectroscopy: Instrumentation01:22

Atomic Emission Spectroscopy: Instrumentation

The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.
Atomic Emission Spectroscopy: Lab01:29

Atomic Emission Spectroscopy: Lab

AES is a powerful analytical technique, especially effective when used with plasma sources, producing abundant spectra in characteristic emission lines. The Inductively Coupled Plasma (ICP), in particular, yields superior quantitative analytical data due to its high stability, low noise, low background, and minimal interferences under optimal experimental conditions. However, newer air-operated microwave sources are emerging as promising alternatives that could be more cost-effective than...
Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle

Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
The ions and electrons produced interact with the fluctuating magnetic field created by a water-cooled...
Measuring Reaction Rates03:09

Measuring Reaction Rates

Polarimetry finds application in chemical kinetics to measure the concentration and reaction kinetics of optically active substances during a chemical reaction. Optically active substances have the capability of rotating the plane of polarization of linearly polarized light passing through them—a feature called optical rotation. Optical activity is attributed to the molecular structure of substances. Normal monochromatic light is unpolarized and possesses oscillations of the electrical field in...
UV–Vis Spectrometers01:14

UV–Vis Spectrometers

The absorbance of UV and visible (UV–visible) radiations is measured using a UV–visible spectrophotometer. Deuterium lamps, which emit UV radiation, and tungsten lamps, which produce radiation in the visible region, are used as light sources in UV–visible spectrophotometers. A monochromator or prism is used for diffraction grating, i.e., to split the incoming radiation into different wavelengths. A system of slits is used to focus the desired wavelength on the sample cell. Samples for...

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Related Experiment Video

Updated: Jun 23, 2026

O-cresol Concentration Online Measurement Based On Near Infrared Spectroscopy Via Partial Least Square Regression
06:50

O-cresol Concentration Online Measurement Based On Near Infrared Spectroscopy Via Partial Least Square Regression

Published on: November 8, 2019

Study of the new ellipsometric measurement method using integrated analyzer in parallel mode.

Peng-Hui Mao1, Yu-Xiang Zheng, Yue-Rui Chen

  • 1The Key Lab of Advanced Photonic Materials and Devices, Department of Optical Science and Engineering, Fudan University, 200433 Shanghai, China.

Optics Express
|May 13, 2009
PubMed
Summary

A novel high-speed ellipsometer was developed using an integrated analyzer and a CCD camera. This instrument accurately measures ellipsometric parameters in under one second, enabling rapid in situ analysis.

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Evanescent Field Based Photoacoustics: Optical Property Evaluation at Surfaces
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Evanescent Field Based Photoacoustics: Optical Property Evaluation at Surfaces

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Last Updated: Jun 23, 2026

O-cresol Concentration Online Measurement Based On Near Infrared Spectroscopy Via Partial Least Square Regression
06:50

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Published on: November 8, 2019

Quantitative Atomic-Site Analysis of Functional Dopants/Point Defects in Crystalline Materials by Electron-Channeling-Enhanced Microanalysis
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Quantitative Atomic-Site Analysis of Functional Dopants/Point Defects in Crystalline Materials by Electron-Channeling-Enhanced Microanalysis

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Evanescent Field Based Photoacoustics: Optical Property Evaluation at Surfaces
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Evanescent Field Based Photoacoustics: Optical Property Evaluation at Surfaces

Published on: July 26, 2016

Area of Science:

  • Optics and Photonics
  • Materials Science

Background:

  • Ellipsometry is a powerful technique for characterizing thin films and surfaces.
  • Traditional ellipsometers can be slow, limiting in situ applications.
  • Need for faster, reliable optical measurement methods.

Purpose of the Study:

  • To develop and evaluate a new, high-speed ellipsometer.
  • To demonstrate rapid and accurate measurement of ellipsometric parameters.
  • To explore potential for in situ, high-precision optical data acquisition.

Main Methods:

  • Construction of an ellipsometer with an integrated analyzer comprising 12 sub-analyzers.
  • Utilizing a two-dimensional CCD array camera for parallel light intensity measurement.
  • Uniform distribution of sub-analyzer azimuth angles over ~180 degrees.

Main Results:

  • Ellipsometric parameters extracted in data acquisition time < 1 second.
  • Accurate measurement of silicon (Si) sample parameters.
  • Good agreement with results from two other ellipsometric methods.

Conclusions:

  • The new ellipsometer offers high speed and reliability in optical data measurement.
  • Potential applications in fields requiring precise in situ data acquisition.
  • Advancement in optical metrology for dynamic material analysis.