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Updated: Jun 23, 2026
Patterning of Microorganisms and Microparticles through Sequential Capillarity-assisted Assembly
Published on: November 4, 2021
A study of simultaneous patterning and alignment of semiconductor nanorods via polymerization-induced phase
Jesse Greener1, Tibert Hendrik van der Loop, Chantal Paquet
1Department of Chemistry, University of Toronto, 80 Saint George Street, Toronto, ON M5S 3H6, Canada.
Abstract:
We report simultaneous patterning and alignment of semiconductor nanorods (NRs) in nanorod-polymer films by using photolithographic polymerization-induced phase separation (PIPS). Exposure of the nanoparticle-monomer mixture to UV irradiation through a mask resulted in the site-specific photoinitiated polymerization of the monomer, which was followed with flow of the NRs from the areas rich in polymer to the areas rich in monomer. The orientation of NRs in the direction of flow was trapped in the polymerized films and characterized in polarization absorption experiments.
