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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Applied physics. Two beams squeeze feature sizes in optical lithography

Joseph W Perry1

  • 1School of Chemistry and Biochemistry and Center for Organic Photonics and Electronics, Georgia Institute of Technology, Atlanta, GA 30332, USA. joe.perry@gatech.edu.

Science (New York, N.Y.)
|May 16, 2009
PubMed
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No abstract available in PubMed .

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