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Updated: Jun 23, 2026

Functional Surface-immobilization of Genes Using Multistep Strand Displacement Lithography
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On-wire lithography: synthesis, encoding and biological applications.

Matthew J Banholzer1, Lidong Qin, Jill E Millstone

  • 1Department of Chemistry and International Institute for Nanotechnology, Northwestern University, Evanston, Illinois, USA.

Nature Protocols
|May 16, 2009
PubMed
Summary

On-wire lithography (OWL) enables precise architectural modifications of nanowires, creating nanoscale gaps and disks. These tailorable nanostructures have potential applications in diagnostics and molecular electronics.

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Area of Science:

  • Nanotechnology
  • Materials Science
  • Nanofabrication

Background:

  • Advancements in nanotechnology require novel methods for modifying basic building blocks like nanowires.
  • On-wire lithography (OWL) is a key technique for creating segmented nanowire structures.

Purpose of the Study:

  • To present a refined OWL protocol for synthesizing multisegmented nanowires with controlled architectural changes.
  • To demonstrate the creation of nanoscale gaps and disks for advanced applications.

Main Methods:

  • Growth of multisegmented nanowires.
  • Deposition of a support layer on nanostructures.
  • Selective chemical etching of sacrificial segments to create gaps and disks.

Main Results:

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  • Successful creation of nanostructures with gaps as small as 2 nm and disks as thin as 20 nm.
  • Demonstration of highly tailorable nanostructures.
  • Functionalization of nanostructures with various adsorbates.

Conclusions:

  • The OWL protocol offers a versatile method for fabricating precisely engineered nanostructures.
  • These nanostructures are suitable for applications in electrical transport, Raman enhancement, energy conversion, and as bioactive probes for diagnostics.