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Fabrication of Silica Ultra High Quality Factor Microresonators
Published on: July 2, 2012
Ultra-high resolution index of refraction profiles of femtosecond laser modified silica structures
Optics Express
|May 23, 2009
Abstract:
The combination of selective chemical etching and atomic force microscopy has been used for the first time to make ultra-high spatial resolution (20 nm) index of refraction profiles of femtosecond laser modified structures in silica glass.
