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There are two main infrared (IR) spectrophotometers: dispersive IR spectrometers and Fourier transform infrared (FTIR) spectrometers. In a dispersive IR spectrometer, a beam of infrared radiation produced by a hot wire is divided into two parallel equal-intensity beams using mirrors. One beam passes through the sample, while another is a reference beam. The beams then move through the monochromator, which separates the radiations into a continuous spectrum of different frequencies. The...

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Fabrication of High Contrast Gratings for the Spectrum Splitting Dispersive Element in a Concentrated Photovoltaic System

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Low polarization dependent diffraction grating for wavelength demultimlexing.

E Popov, J Hoose, B Frankel

|May 28, 2009

Summary

This summary is machine-generated.

A novel grating design for wavelength demultiplexers offers high efficiency and low polarization dependence. Manufactured using silicon etching, it ensures consistent performance for both TE and TM light polarizations.

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Area of Science:

Optoelectronics
Nanofabrication
Integrated Optics

Background:

Wavelength demultiplexers are crucial for optical communication systems.
Achieving low polarization dependence and high diffraction efficiency in gratings is challenging.
Existing designs often struggle with spectral response consistency across polarizations.

Purpose of the Study:

To propose and demonstrate a new grating design for wavelength demultiplexers.
To achieve low polarization dependence and high diffraction efficiency.
To ensure a flat spectral response for both TE and TM polarizations.

Main Methods:

Standard crystallographic etching of a silicon (Si) wafer surface.
Fabrication of a grating structure with optimized groove geometry.
Internal light incidence and diffraction within the wafer.
Application of a reflecting metal layer.

Main Results:

A grating with low polarization dependence was successfully manufactured.
High diffraction efficiency was achieved for the proposed grating.
The optimized groove form resulted in a flat spectral response for both TE and TM polarizations.

Conclusions:

The developed grating is suitable for polarization-insensitive wavelength demultiplexer applications.
Standard silicon etching techniques enable efficient fabrication.
The design offers a promising solution for advanced optical communication components.