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Related Concept Videos

Super-resolution Fluorescence Microscopy01:37

Super-resolution Fluorescence Microscopy

Super-resolution fluorescence microscopy (SRFM) provides a better resolution than conventional fluorescence microscopy by reducing the point spread function (PSF). PSF is the light intensity distribution from a point that causes it to appear blurred. Due to PSF, each fluorescing point appears bigger than its actual size, and it is the PSF interference of nearby fluorophores that causes the blurred image. Various approaches to achieving higher resolution through SRFM have recently been developed.

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Related Experiment Video

Updated: Jun 22, 2026

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
07:47

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

Nonlinear optical lithography with ultra-high sub-Rayleigh resolution.

Sean Bentley, Robert Boyd

    Optics Express
    |June 3, 2009
    PubMed
    Summary

    This study introduces a nonlinear optical interferometric method to significantly enhance lithographic resolution beyond the Rayleigh limit. The technique relies on the nonlinear response of the recording medium, not quantum light properties, for improved resolution.

    Area of Science:

    • Optics and Photonics
    • Nanotechnology
    • Materials Science

    Background:

    • Traditional lithography faces resolution limits defined by the Rayleigh criterion.
    • Enhancing lithographic resolution is crucial for fabricating smaller and more complex micro/nanostructures.
    • Quantum lithography has been proposed as a method to overcome classical resolution limits.

    Purpose of the Study:

    • To describe and experimentally validate a nonlinear optical, interferometric method for arbitrarily improving lithographic resolution.
    • To demonstrate twofold and threefold resolution enhancement beyond the traditional Rayleigh limit.
    • To investigate the underlying mechanism responsible for the enhanced resolution.

    Main Methods:

    • Implementation of a nonlinear optical interferometric technique.

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    Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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    Lensfree On-chip Tomographic Microscopy Employing Multi-angle Illumination and Pixel Super-resolution
    08:41

    Lensfree On-chip Tomographic Microscopy Employing Multi-angle Illumination and Pixel Super-resolution

    Published on: August 16, 2012

    Related Experiment Videos

    Last Updated: Jun 22, 2026

    Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
    07:47

    Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

    Published on: February 12, 2017

    Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
    10:25

    Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

    Published on: September 14, 2018

    Lensfree On-chip Tomographic Microscopy Employing Multi-angle Illumination and Pixel Super-resolution
    08:41

    Lensfree On-chip Tomographic Microscopy Employing Multi-angle Illumination and Pixel Super-resolution

    Published on: August 16, 2012

  • Simulation of N-photon absorption recording media using Nth harmonic generation.
  • Utilizing a CCD camera for detection.
  • Experimental verification of resolution enhancement.

    • Main Results:

    • Achieved twofold and threefold resolution enhancement in experimental setups.
    • Demonstrated high visibility in the resolution improvement.
    • The method's success was independent of quantum features of light.

    Conclusions:

    • The described nonlinear optical method offers a pathway to significantly surpass classical lithographic resolution limits.
    • The enhanced resolution is primarily attributed to the nonlinear optical properties of the recording medium.
    • This technique provides a practical approach to advanced nanolithography without relying on quantum light phenomena.