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Related Concept Videos

Super-resolution Fluorescence Microscopy01:37

Super-resolution Fluorescence Microscopy

Super-resolution fluorescence microscopy (SRFM) provides a better resolution than conventional fluorescence microscopy by reducing the point spread function (PSF). PSF is the light intensity distribution from a point that causes it to appear blurred. Due to PSF, each fluorescing point appears bigger than its actual size, and it is the PSF interference of nearby fluorophores that causes the blurred image. Various approaches to achieving higher resolution through SRFM have recently been developed.
Confocal Fluorescence Microscopy01:16

Confocal Fluorescence Microscopy

Confocal microscopy is an advanced microscopic technique. The prime advantage of the confocal microscope over other microscopy techniques is its ability to block the out-of-focus light from the illuminated samples using pinholes. It is widely used with fluorescence optics to obtain high-resolution, sharp contrast images. Unlike optical microscopes, confocal microscopes use a focused beam of light laser to scan the entire sample surface at different z-planes. These microscopes are, therefore,...
Overview of Electron Microscopy01:25

Overview of Electron Microscopy

The wavelengths of visible light ultimately limit the maximum theoretical resolution of images created by light microscopes. Most light microscopes can only magnify 1000X, and a few can magnify up to 1500X. Electrons, like electromagnetic radiation, can behave like waves, but with wavelengths of 0.005 nm, they produce significantly greater resolution up to 0.05 nm as compared to 500 nm for visible light. An electron microscope (EM) can create a sharp image that is magnified up to 2,000,000X.

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Related Experiment Video

Updated: Jun 22, 2026

Conducting Multiple Imaging Modes with One Fluorescence Microscope
08:32

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Published on: October 28, 2018

Reflection mode imaging with nanoscale resolution using a compact extreme ultraviolet laser.

F Brizuela, G Vaschenko, C Brewer

    Optics Express
    |June 5, 2009
    PubMed
    Summary

    We demonstrated reflection mode imaging of 100 nm features using extreme ultraviolet light. This advances practical surface and nanostructure imaging tools with compact laser sources.

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    Published on: April 25, 2019

    Area of Science:

    • Optics and Photonics
    • Materials Science
    • Nanotechnology

    Background:

    • Current surface and nanostructure imaging techniques face limitations in resolution and accessibility.
    • Compact sources of extreme ultraviolet (EUV) light offer potential for advanced imaging applications.

    Purpose of the Study:

    • To demonstrate reflection mode imaging of 100 nm-scale features using a compact EUV laser.
    • To showcase the utility of a Sc/Si multilayer coated Schwarzschild condenser and a freestanding zone plate objective for high-resolution imaging.

    Main Methods:

    • Utilized a 46.9 nm wavelength light source from a compact capillary-discharge laser.
    • Employed a reflection mode imaging system incorporating a Sc/Si multilayer coated Schwarzschild condenser.
    • Used a freestanding zone plate as the objective lens for high-resolution imaging.

    Main Results:

    • Successfully imaged features at the 100 nm scale using reflection mode microscopy.
    • Demonstrated the effectiveness of the Schwarzschild condenser and zone plate objective in achieving nanoscale resolution.
    • Validated the potential of compact EUV sources for surface and nanostructure imaging.

    Conclusions:

    • The demonstrated reflection mode imaging system achieves 100 nm-scale resolution using a compact EUV laser.
    • This technology represents a significant step towards practical and accessible surface and nanostructure imaging tools.
    • The findings pave the way for broader applications of EUV light in scientific and industrial imaging.