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Related Experiment Video

Updated: Jun 22, 2026

Implementation of a Reference Interferometer for Nanodetection
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Implementation of a Reference Interferometer for Nanodetection

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Through-focus technique for nano-scale grating pitch and linewidth analysis.

Yi-Sha Ku, An-Shun Liu, Nigel Smith

    Optics Express
    |June 6, 2009
    PubMed
    Summary

    This study introduces a through-focus method for precise sub-wavelength feature dimension measurement. The technique enables accurate pitch determination using standard optical microscopes, enhancing metrology capabilities.

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    Area of Science:

    • Optical Metrology
    • Nanotechnology
    • Microscopy

    Background:

    • Accurate measurement of sub-wavelength features is crucial for advanced manufacturing and research.
    • Traditional optical methods face limitations in resolving dimensions below the diffraction limit.
    • Developing accessible techniques for sub-wavelength metrology remains a significant challenge.

    Purpose of the Study:

    • To present and validate a through-focus method for sub-wavelength feature dimension measurement.
    • To demonstrate the linearization of focus indicator derivatives for pitch determination.
    • To show the applicability of the method using standard optical microscopes.

    Main Methods:

    • Experimental investigation of a novel through-focus technique.
    • Linearization of focus indicator partial derivative values.

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    Implementation of a Reference Interferometer for Nanodetection
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    Published on: April 26, 2014

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  • Analysis of through-focus curves derived from images at various focal positions.
  • Evaluation of responses to sub-resolution changes in grating structures.
  • Main Results:

    • The through-focus method successfully linearizes focus indicator derivatives.
    • Pitch determination is achieved using a classical linear method.
    • Through-focus curves exhibit sensitivity to sub-resolution grating structure variations.
    • The method demonstrates a response to sub-wavelength changes.

    Conclusions:

    • Sub-wavelength feature dimensions can be reliably evaluated using the proposed through-focus method.
    • Regular optical microscopes are sufficient for implementing this advanced metrology technique.
    • The method offers a practical approach for high-resolution dimensional analysis.