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Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
Published on: July 21, 2018
Numerical simulation of surface-plasmon-assisted nanolithography.
Optics Express
|June 6, 2009
Summary
This study explores two surface plasmon illumination schemes for high-density, sub-100 nm photolithography using ultraviolet light. These methods, employing a shield layer, offer cost-effective, large-scale pattern transfer with simple adjustments to existing photolithography techniques.
Area of Science:
- Nanotechnology
- Optics
- Materials Science
Background:
- Photolithography is crucial for semiconductor manufacturing.
- Achieving sub-100 nm resolution with traditional methods is challenging.
- Surface plasmon resonance offers potential for nanoscale patterning.
Purpose of the Study:
- To investigate two novel illumination schemes for high-density sub-100 nm photolithography.
- To utilize surface plasmon effects for enhanced pattern transfer.
- To adapt existing photolithography techniques for nanoscale fabrication.
Main Methods:
- Numerical study using the Finite Difference Time Domain (FDTD) method.
- Simulation of two illumination schemes involving a shield layer.
- Analysis of surface plasmon excitation on metallic masks and shield layers.
Main Results:
- Both schemes successfully enabled high-density nanoscale pattern transfer.
- The first scheme utilized a titanium shield layer, exciting surface plasmons on the mask and shield.
- The second scheme employed a silicon dioxide shield layer, avoiding metal contamination.
Conclusions:
- Surface plasmon-based illumination schemes offer a viable route to sub-100 nm photolithography.
- These methods provide convenient, low-cost, and scalable pattern transfer solutions.
- Simple modifications to traditional photolithography can achieve advanced nanoscale fabrication.
