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Rendering SiO2/Si Surfaces Omniphobic by Carving Gas-Entrapping Microtextures Comprising Reentrant and Doubly Reentrant Cavities or Pillars
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Coarsening kinetics of a spinodally decomposed vicinal Si(111) surface

Yongsam Kim1, M H Jo, T C Kim

  • 1Department of Materials Science and Engineering, Center for Extreme Light Applications, Gwangju Institute of Science and Technology, Gwangju, Korea.

Physical Review Letters
|June 13, 2009
PubMed

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