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Semi-conducting properties of titanium dioxide surfaces on titanium implants
Ingela U Petersson1, Johanna E L Löberg, Anette S Fredriksson
1Astra Tech AB, SE-431 21 Mölndal, Sweden. ingela.petersson@astratech.com
Biomaterials
|June 16, 2009
Summary
Surface treatments like blasting and hydrofluoric acid etching alter titanium dioxide (TiO2) oxide layer properties. These modifications, particularly fluoride ion incorporation, enhance oxide conductivity, potentially improving implant-tissue contact.
Area of Science:
- Materials Science
- Biomaterials Engineering
- Surface Chemistry
Background:
- Titanium dioxide (TiO2) layer properties on titanium implants are crucial for osseointegration.
- Surface pre-treatments can intentionally modify TiO2 oxide characteristics.
Purpose of the Study:
- To investigate the semi-conducting properties of naturally formed TiO2 oxide layers on titanium surfaces.
- To evaluate the impact of physical (blasting) and chemical (hydrofluoric acid etching) pre-treatments on TiO2 oxide properties.
Main Methods:
- Impedance spectroscopy was employed to study the semi-conducting properties.
- Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) was used to analyze the TiO+/Ti+ ratio.
- Adsorption studies on a TiO2 suspension were conducted.
Main Results:
- Blasting created defects in the TiO2 layer, increasing charge carriers and conductivity compared to a turned surface.
- Hydrofluoric acid etching of blasted surfaces resulted in an oxide film with even higher conductivity.
- ToF-SIMS data indicated a less stoichiometric oxide for HF-etched samples due to fluoride ion incorporation.
Conclusions:
- Surface treatments significantly alter TiO2 oxide layer conductivity.
- Fluoride ion incorporation, particularly from HF etching, leads to a less stoichiometric and more conductive oxide.
- Increased oxide conductivity may contribute to improved implant-tissue integration, complementing surface roughness effects.
