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Scatterometry-based metrology with feature region signatures matching.

Yi-Sha Ku, Shih-Chun Wang, Deh-Ming Shyu

|June 17, 2009

Summary

Scatterometry, a lithographic process monitoring technique, uses optical diffraction from periodic structures. A new feature region algorithm efficiently extracts grating structure parameters, reducing measurement and library matching needs.

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Area of Science:

Optical physics
Materials science
Nanotechnology

Background:

Scatterometry is a sensitive technique for monitoring lithographic processes.
Optical diffraction from periodic structures provides valuable information about nanoscale features.
Accurate and efficient extraction of structural parameters is crucial for process control.

Purpose of the Study:

To develop an efficient algorithm for extracting grating structure parameters from scatterometry data.
To improve the speed and accuracy of lithographic process monitoring.
To reduce the computational resources required for analyzing diffraction data.

Main Methods:

A feature region measurement algorithm was developed.
The algorithm identifies angles with maximal information content for surface relief profile determination.

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A library data matching process was employed to determine grating structure.

Main Results:

The feature region algorithm accurately and quickly extracts constitutive parameters from diffraction data.
The method efficiently determines grating structure by selecting informative reflectance angles.
Significant reductions in the number of measurements and signature matching library size were achieved.

Conclusions:

The developed feature region algorithm enhances the efficiency of scatterometry for lithographic process monitoring.
This method offers a faster and more resource-efficient approach to nanoscale metrology.
The algorithm's ability to reduce data requirements makes it suitable for high-throughput industrial applications.