Subdiffraction focusing of scanning beams by a negative-refraction layer combined with a nonlinear layer

We evaluate the possibility to focus scanning light beams below the diffraction limit by using the combination of a nonlinear material with a Kerr-type nonlinearity or two-photon absorption to create seed evanescent components of the beam and a negative-refraction material to enhance them. Superfocusing to spots with a FWHM in the range of 0.2 lambda is theoretically predicted both in the context of the effective-medium theory and by the direct numerical solution of Maxwell equations for an inhomogeneous pho-tonic crystal. The evolution of the transverse spectrum and the dependence of superfocusing on the parameters of the negative-refraction material are also studied. We show that the use of a Kerr-type nonlinear layer for the creation of seed evanescent components yields focused spots with a higher intensity compared with those obtained by the application of a saturable absorber.