Plasmolysis and cell wall deposition in wheat root hairs under osmotic stress

We analysed cell wall formation in rapidly growing root hairs of Triticum aestivum under reduced turgor pressure by application of iso- and hypertonic mannitol solutions. Our experimental series revealed an osmotic value of wheat root hairs of 150 mOsm. In higher concentrations (200-650 mOsm), exocytosis of wall material and its deposition, as well as callose synthesis, still occurred, but the elongation of root hairs was stopped. Even after strong plasmolysis when the protoplast retreated from the cell wall, deposits of wall components were observed. Labelling with DiOC(6)(3) and FM1-43 revealed numerous Hechtian strands that spanned the plasmolytic space. Interestingly, the Hechtian strands also led towards the very tip of the root hair suggesting strong anchoring sites that are readily incorporated into the new cell wall. Long-term treatments of over 24 h in mannitol solutions (150-450 mOsm) resulted in reduced growth and concentration-dependent shortening of root hairs. However, the formation of new root hairs does occur in all concentrations used. This reflects the extraordinary potential of wheat root cells to adapt to environmental stress situations.