Integrated shadow mask for sampled Bragg gratings in chalcogenide (As(2)S(3)) planar waveguides

We have developed a new approach for producing high performance sampled Bragg gratings in planar waveguides as a platform for WDM on-chip signal processing in a compact integrated device. Using this method we have successfully integrated a shadow mask directly onto a chalcogenide (As(2)S(3)) waveguide using standard semiconductor processing, eliminating misalignment errors between the mask and waveguide that otherwise occur. Through this integrated mask we demonstrate a very low duty cycle sampled Bragg grating with very narrow rejection peaks and spanning a very broad bandwidth.