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Related Concept Videos

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used.

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Related Experiment Video

Updated: Jun 22, 2026

20 mJ, 1 ps Yb:YAG Thin-disk Regenerative Amplifier
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20 mJ, 1 ps Yb:YAG Thin-disk Regenerative Amplifier

Published on: July 12, 2017

Large-aperture grating tiling by interferometry for petawatt chirped-pulse-amplification systems.

J Qiao, A Kalb, M J Guardalben

    Optics Express
    |June 24, 2009
    PubMed
    Summary

    A new tiled-grating assembly with real-time interferometric control was developed for the OMEGA EP Laser Facility. This system enables automatic tiling and wavefront reconstruction, crucial for laser performance.

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    Fabrication of High Contrast Gratings for the Spectrum Splitting Dispersive Element in a Concentrated Photovoltaic System
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    Published on: July 18, 2015

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    Last Updated: Jun 22, 2026

    20 mJ, 1 ps Yb:YAG Thin-disk Regenerative Amplifier
    10:17

    20 mJ, 1 ps Yb:YAG Thin-disk Regenerative Amplifier

    Published on: July 12, 2017

    Fabrication of High Contrast Gratings for the Spectrum Splitting Dispersive Element in a Concentrated Photovoltaic System
    12:08

    Fabrication of High Contrast Gratings for the Spectrum Splitting Dispersive Element in a Concentrated Photovoltaic System

    Published on: July 18, 2015

    Area of Science:

    • Laser Physics
    • Optical Engineering
    • Metrology

    Background:

    • Large-scale gratings are essential components in high-power laser systems.
    • Precise alignment and tiling of multiple gratings are critical for optimal performance.
    • OMEGA EP Laser Facility requires advanced optical solutions for its demanding applications.

    Purpose of the Study:

    • To develop a tiled-grating assembly with real-time interferometric tiling control.
    • To implement an automatic tiling method for large-scale gratings.
    • To analyze the sensitivity of tiling parameters and focal-spot degradation in a pulse compressor.

    Main Methods:

    • Development of a three-large-scale grating assembly.
    • Implementation of real-time interferometric tiling control.
    • Automatic tiling procedure for wavefront reconstruction.
    • Sensitivity analysis of tiling errors on focal-spot quality.

    Main Results:

    • Successful development of a tiled-grating assembly with three gratings.
    • Achievement of an automatic tiling method for precise grating alignment.
    • Reconstruction of the overall wavefront for the tiled assembly.
    • Quantification of focal-spot degradation due to tiling errors.

    Conclusions:

    • The developed tiled-grating assembly and automatic tiling method are effective for large-scale grating alignment.
    • Understanding tiling parameter sensitivity is vital for minimizing focal-spot degradation in pulse compressors.
    • This technology enhances the performance and reliability of the OMEGA EP Laser Facility.