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45 degree polymer micromirror integration for board-level three-dimensional optical interconnects.
Fengtao Wang1, Fuhan Liu, Ali Adibi
1School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA 30332, USA. wangft@ece.gatech.edu
Optics Express
|June 25, 2009
Summary
We developed a simple method for integrating micro-mirrors with polymer optical waveguides using tilted beam photolithography. This technique enables efficient surface normal light coupling for optical interconnects on printed circuit boards.
Area of Science:
- Optoelectronics
- Materials Science
- Photonics
Background:
- Optical interconnects are crucial for high-speed data transmission.
- Integrating optical components with electronic systems presents manufacturing challenges.
- Efficient light coupling is essential for minimizing signal loss.
Purpose of the Study:
- To introduce a simple method for integrating micro-mirrors with polymer optical waveguides.
- To achieve surface normal light coupling for optical interconnects.
- To ensure compatibility with printed circuit board (PCB) manufacturing.
Main Methods:
- Utilized improved tilted beam photolithography on PCBs.
- Employed de-ionized water to couple ultraviolet (UV) beams through the waveguide core at a 45-degree angle.
- Integrated 45-degree total internal reflection micro-mirrors with polymer optical waveguides.
Main Results:
- Achieved accurate mirror slope control within +/- 1 degree with high repeatability.
- Demonstrated surface normal light coupling between waveguides and optoelectronic devices.
- Measured an insertion loss of 1.6 dB for an uncoated micro-mirror.
Conclusions:
- The developed technique offers a simple and repeatable method for integrating micro-mirrors and waveguides.
- This approach is compatible with existing PCB manufacturing facilities for large-scale production.
- The method facilitates efficient light coupling for advanced optical interconnects.
