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Updated: Jun 22, 2026

Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
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Localized surface plasmon nanolithography with ultrahigh resolution.

Xingzhan Wei, Xiangang Luo, Xiaochun Dong

    Optics Express
    |June 25, 2009
    PubMed
    Summary

    Localized surface plasmon nanolithography (LSPN) achieves sub-20nm patterns by enhancing near-field effects. This technique uses grating structures to excite surface plasmon polaritons for efficient, high-resolution nanolithography.

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    Area of Science:

    • Physics
    • Materials Science
    • Nanotechnology

    Background:

    • Nanolithography techniques are crucial for fabricating nanoscale devices.
    • Achieving sub-20nm resolution with high efficiency and contrast remains a challenge.

    Purpose of the Study:

    • To propose and demonstrate a localized surface plasmon nanolithography (LSPN) technique.
    • To achieve sub-20nm line width patterns with enhanced contrast and spatial resolution.

    Main Methods:

    • Utilizing metallic mask grating structures to excite surface plasmon polaritons (SPPs).
    • Employing SPP wave propagation along taper surfaces for energy accumulation at a tip.
    • Leveraging near-field optical effects for high local field enhancements.

    Main Results:

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    Last Updated: Jun 22, 2026

    Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
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    Published on: July 21, 2018

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    • Demonstrated pattern generation with sub-20nm line width.
    • Achieved high transmission efficiency by adjusting grating period.
    • Observed significant local electric field intensity enhancement at the tip.

    Conclusions:

    • LSPN technique effectively produces sub-20nm patterns with high resolution and contrast.
    • The method facilitates efficient nanolithography using simple ultraviolet light sources.
    • Optimized grating structures and SPP excitation are key to the technique's success.