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Related Concept Videos

Atomic Fluorescence Spectroscopy01:29

Atomic Fluorescence Spectroscopy

Atomic fluorescence spectroscopy (AFS) is an analytical technique that involves the electronic transitions of atoms in a flame, furnace, or plasma being excited by electromagnetic (EM) radiation. When these atoms absorb energy, they become excited and subsequently release energy as they return to their original state. This emitted light, or "fluorescence," is observed at a right angle to the incident beam. Both absorption and emission processes transpire at distinct wavelengths, which are...

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Related Experiment Video

Updated: Jun 22, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Published on: September 14, 2018

Fluorinated acid amplifiers for EUV lithography.

Seth Kruger1, Sri Revuru, Craig Higgins

  • 1College of Nanoscale Science and Engineering, University at Albany, Albany, New York 12203, USA.

Journal of the American Chemical Society
|July 3, 2009
PubMed
Summary
This summary is machine-generated.

New acid amplifiers for extreme ultraviolet (EUV) photoresists were developed. These compounds generate acids that enhance resolution, sensitivity, and reduce line edge roughness (LER) in EUV lithography.

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Area of Science:

  • Materials Science
  • Organic Chemistry
  • Nanotechnology

Background:

  • Extreme ultraviolet (EUV) lithography is crucial for advanced semiconductor manufacturing.
  • Photoresists require high performance in resolution, sensitivity, and line edge roughness (LER).
  • Acid amplifiers play a key role in EUV photoresist chemistry.

Purpose of the Study:

  • To synthesize novel acid amplifiers for EUV photoresists.
  • To investigate the decomposition kinetics and mechanisms of these amplifiers.
  • To evaluate their performance in improving critical lithographic parameters.

Main Methods:

  • Synthesis of five new organic compounds.
  • Kinetic studies of compound decomposition using fluorine-19 nuclear magnetic resonance ((19)F NMR).
  • Evaluation of lithographic performance in EUV photoresists.

Main Results:

  • Four synthesized compounds function as effective acid amplifiers.
  • Autocatalytic decomposition generates fluorinated sulfonic acids.
  • Decomposition rates were significantly faster in the absence of a base (up to 1430x).
  • One compound, cis-1-methyl-2-(4-(trifluoromethyl)phenylsulfonyloxy)cyclohexyl acetate, demonstrated simultaneous improvements in resolution, LER, and sensitivity.

Conclusions:

  • The developed acid amplifiers show promise for advancing EUV lithography.
  • Controlled acid generation is key to enhancing photoresist performance.
  • Further optimization could lead to next-generation EUV resists.