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Microelectrode Guided Implantation of Electrodes into the Subthalamic Nucleus of Rats for Long-term Deep Brain Stimulation
Published on: October 2, 2015
Approach for tunneling the lead in deep brain stimulation
Andrew J Fabiano1, Robert J Plunkett
1Department of Neurosurgery, School of Medicine and Biomedical Sciences, University at Buffalo, State University of New York, Buffalo, New York, USA.
Journal of Neurosurgery
|July 28, 2009
Summary
This study presents a new technique for deep brain stimulator (DBS) lead placement. Retrograde tunneling during initial surgery simplifies future connections and may prevent lead damage.
Area of Science:
- Neurosurgery
- Medical Devices
- Neurological Implants
Background:
- Deep brain stimulator (DBS) implantation is typically a two-stage surgery.
- The first stage involves electrode placement, with pulse generator connection in a second operation.
Purpose of the Study:
- To describe a practical technique for retrograde tunneling of the DBS lead during the initial implantation procedure.
- To simplify the subsequent connection of the lead to the pulse generator.
Main Methods:
- A technique for retrograde tunneling of the stimulator lead is detailed.
- After DBS electrode placement, the lead is tunneled in a retrograde fashion into a subgaleal pocket.
- A protective cap and boot are used to cover the lead during tunneling.
Main Results:
- The described technique facilitates the connection of the lead to the pulse generator wire in the subsequent operation.
- This method may potentially reduce the risk of lead damage during the implantation process.
Conclusions:
- Retrograde tunneling of the DBS lead during initial implantation is a practical approach.
- This technique streamlines the surgical process and may improve patient outcomes by minimizing lead complications.
