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Updated: Jun 21, 2026

Characterizing DNA Repair Processes at Transient and Long-lasting Double-strand DNA Breaks by Immunofluorescence Microscopy
Published on: June 8, 2018
Scanning force microscopy studies of X-ray-induced double-strand breaks in plasmid DNA
M Brezeanu1, F Träger, F Hubenthal
1Institute of Physics and Center for Interdisciplinary Nanostructure Science and Technology-CINSaT, University of Kassel, 34132 Kassel, Germany. brezeanu@physik.uni-kassel.de
Abstract:
We present an analysis of X-ray-induced damage in PhiX174 plasmid DNA, applying doses between D = 250 and 1,500 Gy. To analyse this damage in detail, the distribution of plasmid fragments after irradiation have been determined by scanning force microscopy. The results show that even for the lowest dose of D = 250 Gy, a significant amount of double-strand breaks are observed. For increasing dose, the percentage of small fragments increases and is accompanied by a shortening of the average fragment length from < L > = 1,400 nm for a dose of D = 250 Gy to < L > = 1,080 nm after irradiation with D = 1,500 Gy. The most crucial parameter, the average number of double-strand breaks per broken plasmid (

