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Updated: Jun 21, 2026

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
Published on: December 16, 2011
Sub-10-nm patterning of oligo(ethylene glycol) monolayers on silicon surfaces via local oxidation using a conductive
1Department of Chemistry, University of Houston, Houston, TX 77204-5003, USA.
Abstract:
We demonstrate that local oxidation using a conductive atomic force microscope (c-AFM) can achieve patterning of sub-10-nm spots on protein-resistant oligo(ethylene glycol)-terminated alkyl monolayers on silicon substrates. Such a high resolution of nanopatterning with a c-AFM on organic thin films was realized for the first time by applying ultrashort (50-100 ns) voltage pulses to the silicon substrate relative to the conducting AFM tip. Furthermore, the nanopatterning can be controlled at the surface of the hydrophilic monolayer without oxidizing the silicon interface.

