Negative spherical aberration ultrahigh-resolution imaging in corrected transmission electron microscopy
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Updated: Jun 20, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Knut W Urban1, Chun-Lin Jia, Lothar Houben
1Institute of Solid State Research and Ernst Ruska Centre for Microscopy and Spectroscopy with Electrons, Research Centre Jülich, 52425 Jülich, Germany. k.urban@fz-juelich.de
Abstract:
Aberration-corrected transmission electron microscopy allows us to image the structure of matter at genuine atomic resolution. A prominent role for the imaging of crystalline samples is played by the negative spherical aberration imaging (NCSI) technique. The physical background of this technique is reviewed. The especially high contrast observed under these conditions owes its origin to an enhancing combination of amplitude contrast due to electron diffraction channelling and phase contrast. A number of examples of the application of NCSI are reviewed in order to illustrate the applicability and the state-of-the-art of this technique.
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