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Published on: October 11, 2016
Integrated grating circuit for guided-beam multiple division fabricated by electron-beam direct writing
Y Handa1, T Suhara, H Nishihara
1Department of Electronics, Faculty of Engineering, Osaka University, Yamada-kami, Suita, Osaka, 565 Japan.
Optics Letters
|August 21, 2009
Summary
An integrated grating circuit (IGC) was fabricated using electron-beam writing in an As2S3 film waveguide. This novel device successfully divided infrared guided beams into multiple beams, demonstrating excellent optical performance.
Area of Science:
- Photonics and optical engineering
- Materials science
- Waveguide optics
Background:
- Integrated grating circuits (IGCs) are crucial for manipulating guided light beams.
- Efficient beam division is essential for various optical applications, including sensing and communication.
- As2S3 (arsenic sulfide) thin films offer favorable optical properties for waveguide fabrication.
Purpose of the Study:
- To design and fabricate an IGC for guided-beam multiple division.
- To investigate the optical performance of the fabricated IGC.
- To demonstrate the feasibility of using electron-beam direct writing for IGC fabrication.
Main Methods:
- Fabrication of an IGC in an As2S3 film waveguide using electron-beam direct writing.
- Integration of one chirped and three uniform-period gratings within the circuit.
- Testing the IGC with an incident infrared (IR) guided beam at lambda = 1.153 microm.
Main Results:
- Successful fabrication of a 1.0 X 3.0 mm IGC.
- Demonstration of guided-beam multiple division with excellent optical performance.
- Verification that gratings satisfy the Bragg condition for effective beam splitting.
Conclusions:
- The developed IGC is effective for guided-beam multiple division.
- Electron-beam direct writing is a viable technique for fabricating complex IGCs in As2S3 waveguides.
- The demonstrated optical performance highlights the potential of this technology for integrated optics.

