Stress and DNA assembly differences on cantilevers gold coated by resistive and e-beam evaporation techniques

M Arroyo-Hernández1, J Tamayo, J L Costa-Krämer

  • 1Instituto de Microelectrónica de Madrid, IMM-CNM-CSIC, Isaac Newton 8, PTM, 28760 Tres Cantos, Madrid, Spain. marroyo@imm.cnm.csic.es

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