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Three-dimensional Optical-resolution Photoacoustic Microscopy
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Published on: May 3, 2011

High-resolution laser lithography system based on two-dimensional acousto-optic deflection.

Manuel Koechlin1, Gorazd Poberaj, Peter Günter

  • 1Institute of Quantum Electronics, Nonlinear Optics Laboratory, ETH Zurich, 8093 Zurich, Switzerland. koechlin@phys.ethz.ch

The Review of Scientific Instruments
|September 4, 2009
PubMed
Summary
This summary is machine-generated.

This study introduces a compact laser lithography system for rapid prototyping of integrated optics. The system achieves high-resolution 200 nm structures and 150 nm gaps, ideal for microring resonators.

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Area of Science:

  • Photonics and Optical Engineering
  • Nanofabrication
  • Materials Science

Background:

  • Advanced integrated optics require high-resolution patterning techniques.
  • Existing lithography methods can be slow or limited in feature size for complex structures.

Purpose of the Study:

  • To develop a high-resolution, compact laser lithography system for fast prototyping of integrated optics.
  • To enable precise fabrication of microring resonators and photonic crystal structures.

Main Methods:

  • Utilized a 375 nm continuous wave diode laser and a 2D acousto-optical deflector for beam steering and intensity control.
  • Employed a three-axis (xyz) stage for precise sample positioning.
  • Achieved sub-200 nm feature resolution using a high numerical aperture (1.40) objective lens.
  • Implemented a two-step lithography process to create small gaps between structures.

Main Results:

  • Demonstrated structure widths of approximately 200 nm.
  • Achieved gaps as small as 150 nm between adjacent structures.
  • Obtained a write-field of up to 200x200 µm².
  • Produced superior photoresist masks for microring resonators with coupling ports.

Conclusions:

  • The developed laser lithography system is effective for rapid, high-resolution prototyping of complex integrated optical devices.
  • The system's capabilities in achieving small feature sizes and gaps are crucial for advanced photonic applications.