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Updated: Jun 20, 2026

Experiments on Ultrasonic Lubrication Using a Piezoelectrically-assisted Tribometer and Optical Profilometer
Published on: September 28, 2015
Optical precision profilometer using the differential method
A new optical precision profilometer minimizes vertical vibration effects for accurate height measurements. This advanced instrument enables precise surface analysis of materials like silicon wafers, achieving a low noise level of 0.05 nm root mean square.
Area of Science:
- Optical Engineering
- Metrology
- Surface Science
Background:
- Vertical vibrations significantly impact the accuracy of optical precision profilometry.
- Existing methods often struggle to compensate for environmental disturbances during high-precision measurements.
Purpose of the Study:
- To propose a novel optical precision profilometer design.
- To achieve height measurements that are nearly independent of vertical vibrations.
- To demonstrate the instrument's capability for precise surface analysis.
Main Methods:
- Development of an optical profilometer incorporating simultaneous measurement of the target and its surroundings.
- Implementation of digital subtraction to eliminate the influence of ambient vibrations.
- Characterization of the profilometer's noise level under controlled vibration conditions (0.4 gal).
Main Results:
- The proposed profilometer demonstrates near-independence from vertical vibrations.
- A low noise level of 0.05 nm root mean square was achieved under steady vibrations.
- Successful measurements were performed on an optical flat and a silicon (Si) wafer.
Conclusions:
- The novel optical profilometer offers a robust solution for high-precision surface metrology.
- The digital subtraction technique effectively mitigates vibration-induced errors.
- The instrument is suitable for characterizing delicate optical surfaces and semiconductor wafers.
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