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Related Experiment Video

Updated: Jun 20, 2026

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
13:49

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes

Published on: January 19, 2020

Shadow overlap ion-beam lithography for nanoarchitectures.

Yeonho Choi1, Soongweon Hong, Luke P Lee

  • 1Biomolecular Nanotechnology Center, Berkeley Sensor and Actuator Center, Department of Bioengineering, University of California at Berkeley, Berkeley, California 94720,USA.

Nano Letters
|September 17, 2009
PubMed
Summary

Shadow overlap of ion-beam lithography (SOIL) offers a novel nanofabrication technique. This method overcomes limitations of current lithography, enabling high-resolution, cost-effective, and large-area pattern creation for advanced nanoscale devices.

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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

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Last Updated: Jun 20, 2026

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
07:47

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

Area of Science:

  • Nanotechnology and Materials Science
  • Advanced Lithography Techniques
  • Device Fabrication

Background:

  • High-resolution nanoscale devices are crucial for electronics, memory, solar cells, and sensors.
  • Existing lithography methods (optical, e-beam, ion-beam) face limitations in resolution, throughput, and large-area fabrication.
  • Diffraction limits and throughput constraints hinder the advancement of nanolithography.

Purpose of the Study:

  • To introduce a novel nanofabrication technique called shadow overlap of ion-beam lithography (SOIL).
  • To demonstrate SOIL's capability to surpass the limitations of current lithography methods.
  • To showcase the creation of advanced nanoarchitectures, such as optical antennas, using SOIL.

Main Methods:

  • Utilizing the overlap of two shadow images generated by directional deposition and etching angles.
  • Applying SOIL to prepatterned structures for precise pattern formation.
  • Demonstrating the fabrication of unprecedented nanoarchitectures for optical antennas.

Main Results:

  • SOIL achieves high spatial resolution in nanofabrication.
  • The technique offers parallel processing, tunable geometries, and cost-effectiveness.
  • Unprecedented nanoarchitectures for optical antennas were successfully fabricated using SOIL.

Conclusions:

  • SOIL presents a significant advancement in nanofabrication, overcoming current technological barriers.
  • The method enables tunable, high-resolution patterning for diverse nanoscale applications.
  • SOIL holds potential for impact across nanoscale devices and large-scale 3D innovative lithography.