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Demonstration of Equal-Intensity Beam Generation by Dielectric Metasurfaces
Published on: June 7, 2019
High-efficiency diffractive beam splitters surface-structured on submicrometer scale using deep-UV interference
Jun Amako1, Daisuke Sawaki, Eiichi Fujii
1Seiko Epson Corporation, 3-3-5 Owa, Suwa, Nagano 392-8502, Japan. amako.jun@exc.epson.co.jp
Applied Optics
|September 22, 2009
Summary
Highly efficient diffractive beam splitters for high-power lasers were developed. Surface structuring with submicron relief significantly improved transmitted efficiency by reducing Fresnel reflections.
Area of Science:
- Optics and Photonics
- Materials Science
Background:
- High-power laser systems require efficient optical components.
- Fresnel reflections at interfaces reduce laser system efficiency and can cause damage.
Purpose of the Study:
- To develop highly efficient diffractive beam splitters for high-power laser applications.
- To enhance transmitted efficiency by minimizing Fresnel reflections.
Main Methods:
- Surface structuring using deep-ultraviolet (DUV) interference lithography and reactive ion etching.
- Fabrication of submicron relief structures (140 nm period, 55 nm depth) on fused-silica diffractive beam splitters.
- Immersion of splitters in index-matching liquid during resist exposure.
Main Results:
- Achieved a significant increase in splitting efficiency by 8% at 266 nm.
- Demonstrated considerable reduction in Fresnel reflections.
- The fabricated structures favorably compared with theoretical efficiency values.
Conclusions:
- The developed diffractive beam splitters offer high efficiency for high-power laser applications.
- Submicron surface structuring effectively minimizes Fresnel reflections, enhancing overall performance.
- The employed fabrication techniques are suitable for creating advanced optical components.

