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High-efficiency diffractive beam splitters surface-structured on submicrometer scale using deep-UV interference

Jun Amako1, Daisuke Sawaki, Eiichi Fujii

  • 1Seiko Epson Corporation, 3-3-5 Owa, Suwa, Nagano 392-8502, Japan. amako.jun@exc.epson.co.jp

Applied Optics
|September 22, 2009
PubMed
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Highly efficient diffractive beam splitters for high-power lasers were developed. Surface structuring with submicron relief significantly improved transmitted efficiency by reducing Fresnel reflections.

Area of Science:

  • Optics and Photonics
  • Materials Science

Background:

  • High-power laser systems require efficient optical components.
  • Fresnel reflections at interfaces reduce laser system efficiency and can cause damage.

Purpose of the Study:

  • To develop highly efficient diffractive beam splitters for high-power laser applications.
  • To enhance transmitted efficiency by minimizing Fresnel reflections.

Main Methods:

  • Surface structuring using deep-ultraviolet (DUV) interference lithography and reactive ion etching.
  • Fabrication of submicron relief structures (140 nm period, 55 nm depth) on fused-silica diffractive beam splitters.
  • Immersion of splitters in index-matching liquid during resist exposure.

Main Results:

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  • Achieved a significant increase in splitting efficiency by 8% at 266 nm.
  • Demonstrated considerable reduction in Fresnel reflections.
  • The fabricated structures favorably compared with theoretical efficiency values.

Conclusions:

  • The developed diffractive beam splitters offer high efficiency for high-power laser applications.
  • Submicron surface structuring effectively minimizes Fresnel reflections, enhancing overall performance.
  • The employed fabrication techniques are suitable for creating advanced optical components.