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Heterostructure multilevel binary optics.

E Hasman, N Davidson, A A Friesem

|September 25, 2009

Summary

This summary is machine-generated.

This study presents a novel method for creating multilevel diffractive optical elements with precise height control, achieving high diffraction efficiencies. The technique utilizes standard deposition and lithography for advanced optical element fabrication.

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Area of Science:

Optics and Photonics
Materials Science

Background:

Diffractive optical elements (DOEs) are crucial for manipulating light.
Achieving high diffraction efficiency in DOEs requires precise control over feature dimensions, particularly height.

Purpose of the Study:

To present a method for fabricating multilevel diffractive elements (kinoforms) with highly accurate level heights.
To demonstrate the capability of achieving high diffraction efficiencies using the proposed method.

Main Methods:

The method employs conventional deposition technology.
It utilizes selective etching techniques.
Multimask lithography is a key component of the fabrication process.

Main Results:

The developed method enables the formation of heterostructure multilevel binary optical elements.
High diffraction efficiencies are attainable due to accurate level height control.
A reflective multilevel element for 10.6-microm radiation was successfully designed, recorded, and tested.

Conclusions:

The presented method offers a viable approach for fabricating high-efficiency diffractive optical elements.
The technique integrates standard fabrication processes for practical application.
This work validates the design and performance of a specific 10.6-microm reflective element.