Design and fabrication of a polarization-independent two-port beam splitter

We design and manufacture a fused-silica polarization-independent two-port beam splitter grating. The physical mechanism of this deeply etched grating can be shown clearly by using the simplified modal method with consideration of corresponding accumulated phase difference of two excited propagating grating modes, which illustrates that the binary-phase fused-silica grating structure depends little on the incident wavelength, but mainly on the ratio of groove depth to grating period and the ratio of incident wavelength to grating period. These analytic results would also be very helpful for wavelength bandwidth analysis. The exact grating profile is optimized by using the rigorous coupled-wave analysis. Holographic recording technology and inductively coupled plasma etching are used to manufacture the fused-silica grating. Experimental results agree well with the theoretical values.