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Updated: Jun 19, 2026

Fabrication and Optimization of Type II Silicon Clathrate Films
Published on: October 14, 2025
Chemically anisotropic single-crystalline silicon nanotetrahedra
J W Berenschot1, N R Tas, H V Jansen
1MESA + Institute for Nanotechnology, University of Twente, PO Box 217, NL-7500 AE Enschede, The Netherlands.
Abstract:
We describe a method based on silicon micromachining to machine single-crystalline silicon nanoparticles bounded by (111) faces in the form of tetrahedra. The technology allows the fabrication of tetrahedra in a size range from 20 to 1000 nm side length, and gives the possibility to chemically modify sites (faces, edges and/or tips) within certain limits. The chemical modification is anticipated to facilitate the self-assembly into new supermaterials such as photonic crystals in the diamond lattice.
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