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Published on: August 30, 2007
Core-shell chromium silicide-silicon nanopillars: a contact material for future nanosystems
Mu-Tung Chang1, Chih-Yen Chen, Li-Jen Chou
1Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Republic of China.
Abstract:
Chromium silicide nanostructures are fabricated inside silicon nanopillars grown by the vapor-liquid-solid mechanism. The remarkable field-emission behavior of these nanostructures results from extensive improvement of carrier transport due to the reduced energy barrier between the metal and semiconductor layers. The results warrant consideration of chromium silicide as a potentially important contact material in future nanosystems.
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