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Silicon nanocone arrays deposited by sputtering.

Shyankay Jou¹, Jan-Jen Pan, Bohr-Ran Huang

¹Graduate Institute of Materials Science and Technology, National Taiwan University of Science and Technology, Taipei 106, Taiwan, ROC.

Journal of Nanoscience and Nanotechnology

|November 14, 2009

Summary

Researchers created silicon nanocone arrays using sputter deposition with varying hydrogen concentrations. Higher hydrogen levels yielded nanocones, whose size increased with deposition time, while length saturated.

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Area of Science:

Materials Science
Nanotechnology
Surface Science

Background:

Silicon nanostructures are crucial for advanced electronic and photonic devices.
Controlled synthesis of silicon nanostructures with specific morphologies is essential for tailoring material properties.
Sputter deposition offers a versatile method for thin film and nanostructure fabrication.

Purpose of the Study:

To investigate the influence of hydrogen concentration on silicon nanostructure morphology during sputter deposition.
To explore the growth dynamics, including lateral size and length, of silicon nanocones.
To elucidate the underlying mechanisms governing the formation of silicon nanocones.

Main Methods:

Sputter deposition of silicon onto a silicon substrate.

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Use of gold islands as nucleation sites.

Varied hydrogen concentration in argon-hydrogen working gas mixtures.

Controlled substrate temperature at 450°C.

Analysis of nanostructure morphology as a function of deposition time and gas composition.

Main Results:

Continuous silicon films formed at hydrogen concentrations below 50%.
Silicon nanocone arrays were successfully grown at hydrogen concentrations exceeding 50%.
The lateral size of silicon nanocones increased with deposition time.
The length of silicon nanocones showed saturation with increasing deposition time.

Conclusions:

Hydrogen concentration is a critical parameter controlling the morphology of sputter-deposited silicon nanostructures.
The observed growth behavior suggests a complex interplay between deposition rate, surface diffusion, and etching effects.
Understanding these mechanisms enables the tailored fabrication of silicon nanocone arrays for potential applications.