Related Experiment Video
Updated: Jun 18, 2026

Quantitative Atomic-Site Analysis of Functional Dopants/Point Defects in Crystalline Materials by Electron-Channeling-Enhanced Microanalysis
Published on: May 10, 2021
Manifold enhancement of electron beam induced deposition rate at grazing incidence
Ilya Sychugov1, Yoshiko Nakayama, Kazutaka Mitsuishi
1Quantum Dot Research Center, National Institute for Materials Science, Tsukuba, Ibaraki, Japan.
Abstract:
It is shown how a significant drawback of the electron beam induced deposition technique, namely its low deposition rate, can be circumvented. By tilting a sample, a larger part of the primary electron beam energy becomes dissipated closer to the interface. This in turn increases the emission of secondary electrons, largely responsible for the deposition of the adsorbed molecule components on the surface. An order of magnitude increase in the deposition rate is reported in the fabrication of metal nanowires from organic precursor gas.
Related Concept Videos
Scanning Electron Microscopy
Fundamental Principles
Accelerated...
Overview of Electron Microscopy
Preparation of Samples for Electron Microscopy
Transmission Electron Microscopy
