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Updated: Jun 17, 2026

Light Enhanced Hydrofluoric Acid Passivation: A Sensitive Technique for Detecting Bulk Silicon Defects
Published on: January 4, 2016
Subsurface damage measurement of ground fused silica parts by HF etching techniques
J Neauport1, C Ambard, P Cormont
1CEA CESTA, F-33114, Le Barp, France. jerome.neauport@cea.fr
Abstract:
Detection and measurement of subsurface damage of ground optical surfaces are of major concern in the assessment of high damage thresholds fused silica optics for high power laser applications. We herein detail a new principle of SSD measurement based on the utilization of HF acid etching. We also review and compare different subsurface damage (SSD) characterization techniques applied to ground and fine ground fused silica samples. We demonstrate good concordance between the different measurements.

