Biasing of Metal-Semiconductor Junctions
Biasing of P-N Junction
Semiconductors
Biasing of FET
Electric Field Inside a Conductor
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Updated: Jun 17, 2026

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
Dong-Hun Chae1, Benjamin Krauss, Klaus von Klitzing
1Max-Planck-Institute for Solid State Research, Heisenbergstrasse 1, 70569 Stuttgart, Germany. D.Chae@fkf.mpg.de
Electron-phonon interactions significantly impact graphene device performance, especially at low carrier densities. Understanding these interactions is crucial for managing energy dissipation in graphene electronics.
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