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Cooling Rate Dependent Ellipsometry Measurements to Determine the Dynamics of Thin Glassy Films
09:32

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Published on: January 26, 2016

A computer-operated following ellipsometer.

J L Ord1, B L Wills

  • 1University of Waterloo.

Applied Optics
|January 12, 2010
PubMed
Summary
This summary is machine-generated.

A new computer-operated ellipsometer rapidly measures thin film buildup and removal. This automated system enhances in situ analysis of anodic oxide films with high precision.

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Area of Science:

  • Materials Science
  • Surface Science
  • Analytical Chemistry

Background:

  • Ellipsometry is a powerful technique for characterizing thin films.
  • Conventional ellipsometers can be slow and require manual operation.
  • In situ monitoring of dynamic processes like film growth is challenging.

Purpose of the Study:

  • To develop and evaluate a computer-operated following ellipsometer.
  • To improve the speed and precision of ellipsometric measurements.
  • To enable real-time, in situ studies of thin film formation and removal.

Main Methods:

  • Modification of a conventional ellipsometer with a process control computer.
  • Automated determination of polarizer and analyzer null positions.
  • Real-time data acquisition and storage for analysis.

Main Results:

  • Achieved null position location in approximately one second.
  • Obtained a measurement resolution of 0.01 degrees.
  • Successfully demonstrated in situ monitoring of anodic oxide film buildup and removal.

Conclusions:

  • The computer-operated ellipsometer significantly enhances the efficiency and accuracy of thin film analysis.
  • This automated system facilitates detailed in situ studies of dynamic surface processes.
  • The instrument provides valuable data for understanding thin film growth mechanisms.