Inverse model of fiber probe aperture size using a non-destructive method

This study establishes a set of theoretical line segment fabrication models of near-field photolithography using radiation field theory-Dill's exposure model and Mack's development model. By combining the theoretical line segment fabrication model and experiments, this work constructs a novel theory of inverse calculation of fiber probe aperture size using the non-destructive method. The experimental and simulation results obtained using the theoretical line segment fabrication model are compared; the error between these results is utilized as an objective function. The Levenberg-Marquardt method is used to search and rationalize the convergence criterion. Fiber probe aperture size that fits the experimental and theoretical model is inverse calculated. According to the results, the probe aperture obtained by this inverse model is d=250.6 nm, while the average size certified by SEM is d(avg)=253.4 nm, the close match indicated that the probe aperture calculated with the inverse model is reasonable and can be accepted. The lithographic fabrication profile can be predicted with the inverse model to get the probe aperture and, then, cooperated with the theoretical simulated values and experimental parameter control. Such a fabrication has an application value for industry. This non-destructive fiber probe aperture measured model can overcome the bottleneck at present to get this value by destructive measurement, thus, it has surmounted contribution in fiber probe aperture measuring techniques.